Description
Nikon T Plan 1x 0.03 MUE12010 EPI Ultra-Low Magnification Macro Industrial Microscope Objective -Mint condition
In exceptional, mint pre-owned condition, this Nikon T Plan 1X / 0.03 EPI objective (Part No. MUE12010) is engineered for ultra-low magnification macro observation and wide-field industrial inspection. Featuring built-in circular polarizing plates and a depolarizer to suppress flare, it delivers high-contrast, crystal-clear imaging even on low-reflectivity samples. Meticulously inspected, cleaned, and optically aligned for flawless performance.
Key Specifications
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Condition: Pre-Owned, Excellent / Mint Condition (Professionally inspected, cleaned, and tested)
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Part Number / SKU: MUE12010
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Magnification: 1X (Ultra-low magnification for macro overview)
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Numerical Aperture (N.A.): 0.03
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Working Distance (WD): 3.8 mm
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Field Number (OFN): 25 mm
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Optical System: Infinity-corrected (∞/0 EPI, Reflected Brightfield)
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Cover Glass Thickness: 0 mm (Designed for coverglass-free industrial and metallurgical samples)
Features & Highlights
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Advanced Flare Suppression: Integrates specialized circular polarizing plates and a depolarizer specifically designed for ultra-low magnification optics, eliminating internal reflections and significantly boosting image contrast.
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Wide-Field Macro Overview: Ideal for macroscopic scanning, rapid navigation, and seamless inspection of semiconductor wafers, PCB boards, and large metallurgical components.
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Guaranteed Optical Integrity: Fully serviced by our optical technicians. The glass is pristine, coatings are intact, and the optical axis has been rigorously calibrated to ensure peak performance right out of the box.
Applications
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Semiconductor wafer and microelectronic device inspection
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Large-area metallurgical and industrial surface analysis
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Macro-overview and sample positioning in custom optical or OEM microscope systems
